2006-03-30 |
Making an Integrated Circuit
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Heating in oxygen grows an insulating coat on the gate
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2006-03-30 |
Making an Integrated Circuit
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Phosphorus ions then penetrate thin oxide to create the source and drain
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2006-03-30 |
Making an Integrated Circuit
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Exposed polycrystal Si is etched away leaving the transistor gate
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2006-03-30 |
Making an Integrated Circuit
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A stripe is exposed in a second photographic emulsion
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2006-03-30 |
Making an Integrated Circuit
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By heating in silane, polycrystal Si is then grown
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2006-03-30 |
Making an Integrated Circuit
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Oxygen reacts with the Si to grow more oxide
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2006-03-30 |
Making an Integrated Circuit
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Exposed nitride is then etched away
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2006-03-30 |
Making an Integrated Circuit
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A shadow mask then exposes a photographic emulsion
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2006-03-30 |
Making an Integrated Circuit
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To make this transistor, first oxide then nitride layers are grown
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2006-03-30 |
Making an Integrated Circuit
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Let's go inside an Intel 4004 microprocessor to see an individual transistor
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