Making an Integrated Circuit

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Episodes

Date Title & Description Contributors
2006-03-30

  Let's go inside an Intel 4004 microprocessor to see an individual transistor

  John C. Bean - UVA Virtual Lab author
2006-03-30

  To make this transistor, first oxide then nitride layers are grown

  John C. Bean - UVA Virtual Lab author
2006-03-30

  A shadow mask then exposes a photographic emulsion

  John C. Bean - UVA Virtual Lab author
2006-03-30

  Exposed nitride is then etched away

  John C. Bean - UVA Virtual Lab author
2006-03-30

  Oxygen reacts with the Si to grow more oxide

  John C. Bean - UVA Virtual Lab author
2006-03-30

  By heating in silane, polycrystal Si is then grown

  John C. Bean - UVA Virtual Lab author
2006-03-30

  A stripe is exposed in a second photographic emulsion

  John C. Bean - UVA Virtual Lab author
2006-03-30

  Exposed polycrystal Si is etched away leaving the transistor gate

  John C. Bean - UVA Virtual Lab author
2006-03-30

  Phosphorus ions then penetrate thin oxide to create the source and drain

  John C. Bean - UVA Virtual Lab author
2006-03-30

  Heating in oxygen grows an insulating coat on the gate

  John C. Bean - UVA Virtual Lab author